添加劑對聚醯亞胺薄膜化學析鍍銅的影響

MUSTIR > College of Service Industries > Department of Child Development and Education > Research Projects in School > Item 987654321/653

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Title:	添加劑對聚醯亞胺薄膜化學析鍍銅的影響
Authors:	顏志超
Contributors:	化學工程與材料科技系
Keywords:	化學鍍銅；添加劑；聚乙烯.咯酮；銅鍍層結晶結構；電磁波遮蔽效果
Date:	2011-12
Issue Date:	2012-05-11 09:47:44 (UTC+8)
Abstract:	本研究將聚醯亞胺薄膜經由氫氧化鉀微蝕刻表面處理後，進行化學析鍍法製備出導電性聚醯亞胺薄膜，並探討聚乙烯.咯酮及碘化鉀兩種添加劑對化學析鍍銅之析鍍速率、表面結構、結晶型態、電阻率之影響。藉由添加劑的加入可降低薄膜的電阻率，提升導電性。將析鍍後薄膜利用 X光粉末繞射儀分析結晶變化，利用四點探針分析表面電性。本研究另一個重點在於將析鍍後的銅箔試片運用於電磁波遮蔽材料方面。
Appears in Collections:	[Department of Child Development and Education] Research Projects in School

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