蒸鍍薄鉻膜折射率、消光係數與應力隨膜厚度變化之研究

MUSTIR > College of Engineering > Department of Opto-Electronic System Engineering > Research Projects in School > Item 987654321/1267

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Title:	蒸鍍薄鉻膜折射率、消光係數與應力隨膜厚度變化之研究
Authors:	江政忠
Contributors:	光電系統工程系
Keywords:	鉻、薄膜、折射率、消光係數、厚度、應力
Date:	2018-10-30
Issue Date:	2018-12-17 09:23:20 (UTC+8)
Abstract:	本研究已使用電子槍蒸鍍法製作不同厚度之鉻薄膜，並使用橢圓偏光儀與穿透式光譜儀量測鉻薄膜的折射率、消光係數與厚度，同時使用干涉相移式菲佐應力量測儀測量鉻薄膜的應力，成功地探討鉻薄膜的折射率、消光係數與應力隨薄膜厚度之變化特性，已具備精準地含有鉻薄膜的光學薄膜設計能力與製鍍技術。鉻薄膜的實際測量穿透率曲線與理論計算穿透率曲線非常相近，證明橢圓偏光儀擬合，所獲得折射率、消光係數與厚度具有相當程度的準確性，也證明本實驗室量測結果的準確性是可信賴的。當加熱鉻薄膜的厚度從10nm 至20nm 時，折射率與消光係數上升的幅度最大。當加熱鉻薄膜的厚度從30nm 至40nm 時，鉻薄膜應力將從壓縮應力轉變為伸張應力，且折射率與消光係數在厚度40nm 具有最大值。
Appears in Collections:	[Department of Opto-Electronic System Engineering] Research Projects in School

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